The NILindustrialday 2022 will take place online via MS TEAMS on June 14 in the afternoon (starting at 13:00) and on June 15 in the morning (until 12:30). All times are given in CEST. A more detailed program will soon be available, details are still subject to change. Also the registration will be available soon. The participation in the NILindustriladay 2022 will be free of charge.

First program announcement

We are proud to have confirmed speakers from the following organizations (in alphabetical order):


ams-OSRAM  —


Femtoprint —

Hoya  —

Imec —



Cea-leti —

Microfluidics Innovation Hub  —

micro resist technology —


NT-D —

Phabulous —



SCIL Nanoimprint Solutions —


SUSS MicroTec —


NILindustrialday 2021 (Online)

We are excited to spread the first save-the-date notification for this year’s NIL INDUSTRIAL DAY 2021! The leading summit for Nanoimprint Lithography and its applications will be held in its 11th anniversary edition in a virtual format, on June 22nd – 23rd 2021.

The program is currently advancing in great steps and we proudly announce an exciting selection of confirmed industrial-user contributions from around the globe:

  • 5microns (Germany)
  • AMO (Germany)
  • Anteryon (Netherlands)
  • Dispelix Oy (Finland)
  • EV Group (Austria)
  • Facebook (USA)
  • GENSPEED Biotech (Austria)
  • imec (Belgium)
  • Leia Inc. (USA)
  • NIL Technology ApS (Denmark)
  • Monash University (Australia)
  • Moveon Technologies Pte Ltd. (Singapore)
  • SCIVAX (Japan)
  • Smart Material Solutions (USA)
  • SÜSS MicroTec (Germany)