Program – NILindustrialday 2018
In March 2018, the 8th edition of the NILindustrialday symposium will be held in Vienna, Austria (March 8-9, 2018).
Symposium Venue is:
Parkhotel Schoenbrunn
Hietzinger Hauptstrasse 10 – 16
1130 Vienna
Detailed Programm with Titles as pdf:
Day 1: March 08, 2018
11:30 Registration
12:30 Opening, Welcome
- Christoph Breitschopf, PROFACTOR
- Gabi Gruetzner, micro resist technology
12:40 APPLICATIONS (Chair: Daniel Fechtig, PROFACTOR)
12:40 High Performance Microbatteriesand Biosensors via Nanoimprinting of 3-D Metal Oxide Electrodes
- James Watkins, University of Massachusetts Amherst
13:00 Metasurface Optical Solar Reflectors for Radiative Cooling of Spacecraft by Nanoimprint
- Dr. Maksim Zalkovskij, NIL Technology ApS
13:20 High hardness and anti-fouling moth-eye structures made by UV-NIL
- Prof. Jun Taniguchi, Tokyo University of Science
13:40 Safe by design bactericidal surfaces via nanoimprinting of surface nanocomposites
- Isabel Rodriguez Fernandez , IMDEA Nanociencia
14:00 Networking & Exhibition
14:40 MASTERING I (Chair: Michael Hornung, AMO GmbH)
14:40 Fabrication of shallow hydrophobic surfaces using high-resolution grayscale lithography and soft-mold imprint
- Robert Kirchner, TU Dresden
15:00 Towards industrial scaling of non-CMOS applications using 5keV multi-ebeam lithography
- Marcel van Kervinck , MAPPER Lithography B.V.
15:20 Electron Multi-Beam Mask Writing for leading-edge 193, EUV and NIL Masks
- Hans Loeschner, IMS Nanofabrication
15:40 Networking & Exhibition
16:20 EQUIPMENT (Chair: Anja Haase, Joanneum Research)
16:20 High volume production of micro- and nanostructured glass sheets for display applications
- Bram Titulaer, Morphotonics B.V.
16:40 Challenges and solutions for the industrial production of micro- and nanostructured films and rigid material
- Wilfried Schipper, temicon GmbH –
17:00 High fidelty replication of complex surface structures by SmartNIL
- Martin Eibelhuber, EV Group (EVG)
17:20 AutoSCIL; status update on tooling, materials and processes
- Marc Verschurren, SCIL Nanoimprint Solutions
17:40 Closing of Day 1
17:50 Walk to the Metro-Station “Hietzing”: Transport to the City Centre for Sightseeing Tours
18:30 Sightseeing Tours
- Imperial Crypt
- Stephansdom
- Imperial Treasury
19:30 Dinner at restaurant Labstelle, Wollzeile 1, 1010 Vienna
Day 2: March 09, 2018
08:00 Networking & Exhibition
08:30 Opening, Welcome
- Michael Muehlberger, PROFACTOR
- Alexander Pogany, bmvit
08:45 PROCESSES and MATERIALS (Chair: Hubert Teyssedre – CEA LETI)
08:45 Step&Repeat UV-NIL for polymer shim fabrication and R2R imprinting of micro-optical structures
- Anja Haase, Joanneum Research
09:05 Nanoimprint replication of complex and undercut bioinspired nanostructures
- Michael Muehlberger, PROFACTOR GmbH
09:20 A novel large area NIL concept for superior surface-patterned optics and automotive applications
- Florian Schlachter, AMO GmbH
09:40 Latest Highlights of Materials and Replication Processes for Industrial Micro-Optics Manufacture
- Marko Vogler, micro resist Technology GmbH
10:00 Determination of the photo curing rate of light curable resins for use in R2R and R2P NIL applications
- Karlis Petersons,Stensborg A/S
10:20 Networking & Exhibition
11:00 MASTERING II (Chair: Helmut Schift, Paul Scherrer Institute)
11:00 3D grayscale lithography with single nanometer accuracy using the NanoFrazor and its application for Nanoimprint mastering
- Felix Holzner, Swisslitho AG
11:20 3D Greytone Lithography Using E-Beam and Laser Direct Write for Master Making
- Holger Sailer, Institut fuer Mikroelektronik Stuttgart (IMS CHIPS)
11:40 Structural colour master stamp (fast and cheap, low-tech high-yield) from Morpho peleides butterfly wings
- Ille C. Gebeshuber, TU Wien
12:00 Lunch
13:20 APPLICATIONS II (Chair: Manuel Thesen, micro resist technology)
13:20 Smart Combination of Nanoimprint Lithography, Nickel Up-plating and Injection Molding for the Manufacturing of Superhydrophobic Plastic Lenses
- Ilja Czolkos, NIL Technology ApS
13:40 High-Speed Roll-to-Roll Hot Embossing of Micrometer and Sub Micrometer Structures Using Seamless Direct Laser Interference Patterning treated Sleeves for the Fabrication of Advanced Security Elements
- Bogdan Voisiat,TU Dresden, Institute of manufacturing technology
14:00 Nanoimprint lithography for advanced light trapping in photovoltaics
- Hubert Hauser, Fraunhofer Institute for Solar Energy Systems ISE
14:20 Closing