Speakers at the NILindustrialday 2016

Confirmed plenary speakers are:


Stephen Chou, Princeton University – 20 Years of Nanoimprint




Iris Bergmair, Sony DADC – Microfluidic cartridge for the new generation of rapid and cost-effective diagnostic biomarker analysis



Remco van Brakel, Philips Group Innovation, Intellectual Property & Standard – 2.5D imprinting with SCIL



Hubert Brückl, Donau-Universität Krems – Magnetic Lab-on-a-Bead




Karen Chong, A*STAR’s Institute of Materials Research and Engineering (IMRE) – Nanoimprinting and Nanoinjection Molding – Accessing Nanoscale On Three-Dimensional Free-Form Products


Dominique Colle, Heidelberg Instruments – Advanced Optimization Method for Grayscale Direct Lithography




Jakub Dostalek, AIT-Austrian Institute of Technology – Plasmonically enhanced fluorescence biosensors




Markus Guttmann, Karlsruhe Institute of Technology Institute of Microstructure Technology – Novel fabrication process for free-formed mold inserts in steel nanostructured by imprint lithography and nickel up-plating



Babak Heidari, Obducat – Industrial use of NanoImprint in Life Science



Felix Holzner, SwissLitho – 3D stamp fabrication with 1 nm vertical resolution using the NanoFrazor



Steffen Howitz, GeSiM GmbH – µCP4.1 – platform for the automated contact printing and nano-imprint lithgraphy process

Mikko Karppinen, VTT TECHNICAL RESEARCH CENTRE OF FINLAND – Imprinted polymer waveguides and integrated optics for photonic interconnects and sensors



Anders Kristensen, Technical University of Denmark – Nanoimprinted plasmonic color metasurfaces for flexible decoration of plastic consumer products



Guggi Kofod, Inmold A/S– Durable nanostructured tools for plastic injection moulding



Stefan Köstler, Joanneum Research – Roll-to-Roll pilot line for large-scale manufacturing of microfluidic devices



Stéfan Landis, CEA – Commissariat à l’énergie atomique et aux énergies alternatives – NIL industrial platform assessment within INSPIRE



Y.C. Lee, Natl. Cheng-Kung University Taiwan – Soft Photomask Lithography for Manufacturing Patterned Sapphire Substrate (PSS) in LED Industry



Heon Lee, Korea University – Fabrication of functional nano-structures using nanoimprint lithography for highly efficient optoelectronic devices

Lars Lindvold, Stensborg – Dark reactions in photopolymers




Hong Yee Low, Singapore University – Nanoimprinting on Curve Substrate via an Elastic Bilayer Mold



Keiko Munechika, aBeam Technologies – Imprinting of High Refracive Index Material for Optical Applications



Theodor Nielsen, NIL Technology ApS – To be announced




Marc Papenheim, University of Wuppertal – Flat, highly flexible composite stamp for nanoimprint




Mathias Rommel , Fraunhofer Institute for Integrated Systems and Device Technology IISB – Stamps for nanoimprint lithography: R&D at Fraunhofer IISB



Thomas Ruhl, temicon GmbH – Production capabilities for seamless micro- and nanostructured sleeves used for Roll-2-Roll processes



Helmut Schift, Paul Scherrer Institut – Diamond like carbon (DLC) leaky waveguide sensors using a simplified SiPol transfer process



Marco Vogler, micro resist technology – Functional Imprint Materials for Industrial Manufacturing of Micro Optics and Complex 3D Patterns



Mads Rostgaard Sonne, Technical University of Denmark – Modelling the flexible stamp deformations during NIL on curved surfaces



Barbara Stadlober, Joanneum Research – Materials – Advanced micro- and nanomanufacturing of large area organic electronics and functional surfaces



Marc Verschurren, Philips Group Innovation, Intellectual Property & Standards– SCIL Nanoimprint Solutions; high volume soft NIL



James Watkins, University of Massachusetts Amherst – Direct Imprinting 2-D and 3-D Nanoparticle/Polymer Hybrid and Crystalline Metal Oxide Structures for Optical, Electronic, and Energy Devices



Harald Zaglmayr, EVG Group – Transition of NIL to high volume manufacturing