The NILindustrialday 2022 will take place online via MS TEAMS on June 14 in the afternoon (starting at 13:00) and on June 15 in the morning (until 12:50). All times are given in CEST.

You can download the program as pdf.

We are proud to have speakers from the following organizations (in  alphabetical order):

 

Benny Ku, AMO – www.amo.de

Martin Salt, ams-OSRAM  —  https://ams-osram.com

Christine Thanner, EVG — https://www.evgroup.com

Rolando Ferrini, Femtoprint — https://www.femtoprint.ch

Ulrike Schulz, Fraunhofer IOF —  https://www.iof.fraunhofer.de

Ran Ji, Germanlitho – www.germanlitho.com

Donna Qin, Hoya  —  https://www.hoya.co.jp/english/

Kristof Lodewijks, imec — https://www.imec-int.com/en

Mathias Kaschel,  IMS CHIPS — https://www.ims-chips.com

Jérôme Reche, Cea-leti — https://www.leti-cea.com/cea-tech/leti/english/Pages/Welcome.aspx

Ronald Tingl, Microfluidics Innovation Hub  — www.microfluidicshub.eu

Arne Schleunitz, micro resist technology — www.microresist.de

Pim Veldhuizen, Morphotonics – https://www.morphotonics.com

Theodor Nielsen, NILT —  https://www.nilt.com

Boris Vratzov, NT-D — http://nt-d.com/index.html

Jessica van Heck, Phabulous — https://phabulous.eu

Junsuk Rho, POSTECH — https://international.postech.ac.kr

Michael Haslinger, PROFACTOR — www.profactor.at

Marc Verschuuren, SCIL Nanoimprint Solutions —  https://www.scil-nano.com

Christophe Peroz, SONY —  https://www.sony.com/en/

Fabian Kloiber, SUSS MicroTec —  https://www.suss.com/en

Oliver Humbach, Temicon – https://www.temicon.de

Jun Taniguchi, Tokyo Universtiy of Science — https://www.tus.ac.jp/en/

James Watkins, University of Massachusetts Amherst – https://www.pse.umass.edu/faculty/researchgroup/watkins