Thank you!

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Dear participants of the NILindustrialday 2025!

Thank you for attending the NILindustrialday 2025 in Vienna. It was a great pleasure to host 137 of you coming from 17 different countries!

Stay tuned for updates regarding the next edition of the NILindustrialday! We are looking forward to meeting you all again soon!

 

 

Climate Impact of the NILindustrialday 2025

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The NILindustrialday 2025 aims at keeping CO2 emissions low by having chosen a Hotel with “Green Hotel” label, being powered by green electricity, heated by district heating and by being easily accessible by public transportation. Also the social event is planned in such a way that no transportation of the participants is required.

Furthermore, we are happy that the NILindustrialday 2025 will be an event with financial climate contribution, in the same way as 2023. We will however not use the term “carbon neutral” or similar misleading wording anymore. This financial contribution will be realized in collaboration with ClimatePartner.

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Dear participants of this year’s combined NNT and NIL-ID,

We, the organizers, hereby like to say a BIG THANK YOU to you all. We gathered about 210 people and 34 exhibitors from the international eco-system related to nanoimprinting and nanoprinting lithographies.

Thanks a ton for coming to the conference!

We are looking forward to meeting you all again. For instance, at the next NNT 2025 conference in California – celebrating 30 years of NIL – as well as at the next NIL-ID conference in Austria, or elsewhere…..

All the very best! And see you soon again!

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We are delighted that number of confirmed exhibitors are exceeding expectations. Those companies that have not yet registered, please contact Lars Montelius for checking further possibilities of arrangements.

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Dear partners

This is an update of our upcoming premier conference, the united NNT & NIL ID conference, to be held in Lund on June 24-27 2024. We are extremely happy to be able to announce a full suite of participating exhibitors and conference delegates. This will indeed be a unique opportunity to meet and discuss with the most important players in the Nanoimprint, nanoprinting and nanolithography ecosystem.

We gratefully acknowledge the exhibiting companies already supporting the united conference:
AUTEX, EV Group, GDNano, German Litho, Heidelberg Instruments, Heteromerge, HighRI Optics, Inkron, Joanneum Research, NDNANO, Nanoscribe, NILT, micro resist technology, Morphotonics, Myrias Optics, Obducat, Optool, Profactor, Raith, Scivax, SCIL and Stensborg.

Those companies that have not yet registered, please do so asap to secure your exhibition space.

Further, we have a great number of confirmed invited speaker for industrial user presentations. Lately, we received a significant number of relevant technical abstracts (from both, academia and industry), covering most important topics of NIL. The detailed conference program is now underway and will soon be finalized, but the preview list of selected contribution can be seen here: https://www.nil-industrialday.org/speakers-2024/

Due to postponements in the past, we will continue to accept abstracts as late submissions. There is maybe a chance to also include some late submissions in the technical program, although the majority will be posters.
We will have a tutorial session on Monday afternoon, they will cover a discussion of important NIL technologies as well as an overview of industrial application. Those of you who like to participate in these tutorials, please register directly by email to Helmut Schift (helmut.schift@psi.ch).

If you that have not yet signed up – please register as soon as possible! We do have some space limitations, so do not wait until last minute. The early bird rate is still valid (until May 31).

We wish you all very warm welcome to an extremely interesting NNT (2024) NIL- ID conference and, of course, to the beautiful, picturesque city of Lund, Sweden.

Conference Chairs
Lars & Arne

Program Chairs
Helmut & Michael