Speakers at the NILindustrialday 2018

Confirmed plenary speakers are:

Ilja Czolkos, NIL Technology ApS – Smart Combination of Nanoimprint Lithography, Nickel Up-plating and Injection Molding for the Manufacturing of Superhydrophobic Plastic Lenses

Martin Eibelhuber, EVG Group – High fidelty replication of complex surface structures by SmartNIL



Ille C. Gebeshuber, TU Wien – Structural colour master stamp (fast and cheap, low-tech high-yield) from Morpho peleides butterfly wings



Anja Haase, Joanneum Research  Step&Repeat UV-NIL for polymer shim fabrication and R2R imprinting of micro-optical structures


Hubert Hauser, Fraunhofer Institute for Solar Energy Systems ISE – Nanoimprint lithography for advanced light trapping in photovoltaics



Felix Holzner, Swisslitho – 3D grayscale lithography with single nanometer accuracy using the NanoFrazor and its application for Nanoimprint mastering



Marcel van Kervinck , MAPPER Lithography B.V. – Towards industrial scaling of non-CMOS applications using 5keV multi-ebeam lithography



Robert Kirchner, TU Dresden – Fabrication of shallow hydrophobic surfaces using high-resolution grayscale lithography and soft-mold imprint



Hans Loeschner, IMS Nanofabrication – Electron Multi-Beam Mask Writing for leading-edge 193, EUV and NIL Masks




Karlis Petersons,Stensborg A/S– Determination of the photo curing rate of light curable resins for use in R2R and R2P NIL applications




Isabel Rodriguez Fernandez , IMDEA Nanociencia – Safe by design bactericidal surfaces via nanoimprinting of surface nanocomposites



Holger Sailer, Institut fuer Mikroelektronik Stuttgart (IMS CHIPS)– 3D Greytone Lithography Using E-Beam and Laser Direct Write for Master Making




Florian Schlachter, AMO GmbH – A novel large area NIL concept for superior surface-patterned optics and automotive applications




Wilfried Schipper, temicon GmbH – Challenges and solutions for the industrial production of micro- and nanostructured films and rigid material



Prof. Jun Taniguchi, Tokyo University of Science – High hardness and anti-fouling moth-eye structures made by UV-NIL




Bram Titulaer, Morphotonics B.V. – High volume production of micro- and nanostructured glass sheets for display applications



Marc Verschurren, SCIL Nanoimprint Solutions – AutoSCIL; status update on tooling, materials and processes



Bogdan Voisiat,TU Dresden, Institute of manufacturing science and engineering – High-Speed Roll-to-Roll Hot Embossing of Micrometer and Sub Micrometer Structures Using Seamless Direct Laser; Interference Patterning treated Sleeves for the Fabrication of Advanced Security Elements

Marko Vogler, micro resist Technology GmbH – Latest Highlights of Materials and Replication Processes for Industrial Micro-Optics Manufacture





Dr. Maksim Zalkovskij, NIL Technology ApS – Metasurface Optical Solar Reflectors for Radiative Cooling of Spacecraft by Nanoimprint