Speakers at the NILindustrialday 2018

Confirmed plenary speakers are:

Ilja Czolkos, NIL Technology ApS – Smart Combination of Nanoimprint Lithography, Nickel Up-plating and Injection Molding for the Manufacturing of Superhydrophobic Plastic Lenses

Martin Eibelhuber, EVG Group – High fidelty replication of complex surface structures by SmartNIL

 

 

Ille C. Gebeshuber, TU Wien – Structural colour master stamp (fast and cheap, low-tech high-yield) from Morpho peleides butterfly wings

 

 

Anja Haase, Joanneum Research – Step&Repeat UV-NIL for polymer shim fabrication and R2R imprinting of micro-optical structures

 

Hubert Hauser, Fraunhofer Institute for Solar Energy Systems ISE – Nanoimprint lithography for advanced light trapping in photovoltaics

 

 

Felix Holzner, Swisslitho – 3D grayscale lithography with single nanometer accuracy using the NanoFrazor and its application for Nanoimprint mastering

 

 

Marcel van Kervinck , MAPPER Lithography B.V. – Towards industrial scaling of non-CMOS applications using 5keV multi-ebeam lithography

 

 

Robert Kirchner, TU Dresden – Fabrication of shallow hydrophobic surfaces using high-resolution grayscale lithography and soft-mold imprint

 

 

Hans Loeschner, IMS Nanofabrication – Electron Multi-Beam Mask Writing for leading-edge 193, EUV and NIL Masks

 

 

 

Karlis Petersons,Stensborg A/S– Determination of the photo curing rate of light curable resins for use in R2R and R2P NIL applications

 

 

 

Isabel Rodriguez Fernandez , IMDEA Nanociencia – Safe by design bactericidal surfaces via nanoimprinting of surface nanocomposites

 

 

Holger Sailer, Institut fuer Mikroelektronik Stuttgart (IMS CHIPS)– 3D Greytone Lithography Using E-Beam and Laser Direct Write for Master Making

 

 

 

Florian Schlachter, AMO GmbH – A novel large area NIL concept for superior surface-patterned optics and automotive applications

 

 

 

Wilfried Schipper, temicon GmbH – Challenges and solutions for the industrial production of micro- and nanostructured films and rigid material

 

 

Prof. Jun Taniguchi, Tokyo University of Science – High hardness and anti-fouling moth-eye structures made by UV-NIL

 

 

 

Bram Titulaer, Morphotonics B.V. – High volume production of micro- and nanostructured glass sheets for display applications

 

 

Marc Verschurren, SCIL Nanoimprint Solutions – AutoSCIL; status update on tooling, materials and processes

 

 

Bogdan Voisiat,TU Dresden, Institute of manufacturing science and engineering – High-Speed Roll-to-Roll Hot Embossing of Micrometer and Sub Micrometer Structures Using Seamless Direct Laser; Interference Patterning treated Sleeves for the Fabrication of Advanced Security Elements

Marko Vogler, micro resist Technology GmbH – Latest Highlights of Materials and Replication Processes for Industrial Micro-Optics Manufacture

 

 

• James Watkins, University of Massachusetts Amherst  – High Performance Microbatteriesand Biosensors via Nanoimprinting of 3-D Metal Oxide Electrodes

 

 

Dr. Maksim Zalkovskij, NIL Technology ApS – Metasurface Optical Solar Reflectors for Radiative Cooling of Spacecraft by Nanoimprint