The session chairs have been added to the program + some additional minor changes. Have a look!

The updated program is now available. Please have a look, and don’t forget to register!

We are happy, that the first version of the program is now online! You can find it here. We hope that you will like it!

The NILindustrialday 2022 will take place online via MS TEAMS on June 14 in the afternoon (starting at 13:00) and on June 15 in the morning (until 12:30). All times are given in CEST. A more detailed program will soon be available, details are still subject to change. Also the registration will be available soon. The participation in the NILindustriladay 2022 will be free of charge.

We are proud to have confirmed speakers from the following organizations (in alphabetical order):

ams-OSRAM  —  https://ams-osram.com

EVG — https://www.evgroup.com

Femtoprint — https://www.femtoprint.ch

Hoya  —  https://www.hoya.co.jp/english/

Imec — https://www.imec-int.com/en

IMRE — https://www.a-star.edu.sg/imre

IMS CHIPS — https://www.ims-chips.com

Cea-leti — https://www.leti-cea.com/cea-tech/leti/english/Pages/Welcome.aspx

Microfluidics Innovation Hub  — https://www.nextgenmicrofluidics.eu/microfluidics-innovation-hub/

micro resist technology — www.microresist.de

NILT —  https://www.nilt.com

NT-D — http://nt-d.com/index.html

Phabulous — https://phabulous.eu

POSTECH — https://international.postech.ac.kr

PROFACTOR — www.profactor.at

SCIL Nanoimprint Solutions —  https://www.scil-nano.com

SONY —  https://www.sony.com/en/

SUSS MicroTec —  https://www.suss.com/en

The date for the NILindustrialday 2022 is fixed now with 14-15 June 2022.
We would appreciate to welcome you to this virtual event!

You can find the program here

We are excited to spread the first save-the-date notification for this year’s NIL INDUSTRIAL DAY 2021! The leading summit for Nanoimprint Lithography and its applications will be held in its 11^th anniversary edition in a virtual format, on June 22^nd – 23^rd 2021.

The program is currently advancing in great steps and we proudly announce an exciting selection of confirmed industrial-user contributions from around the globe:

• 5microns (Germany)
• AMO (Germany)
• Anteryon (Netherlands)
• Dispelix Oy (Finland)
• EV Group (Austria)
• Facebook (USA)
• GENSPEED Biotech (Austria)
• imec (Belgium)
• Leia Inc. (USA)
• NIL Technology ApS (Denmark)
• Monash University (Australia)
• Moveon Technologies Pte Ltd. (Singapore)
• SCIVAX (Japan)
• Smart Material Solutions (USA)
• SÜSS MicroTec (Germany)